In November of 2018, IEN’s Laser Micro Machining Center (LMMC) took delivery of Optec’s WS-FLEX-USP femtosecond, direct-write laser system configured to support the Institute’s diverse research interests as applied to texturing and surface modification of metals, ceramics, composites, polymers and glasses in the fields of biocompatible materials, microfluidics, flexible electronics, MEMS/NEMS microsystems, photovoltaics and energy storage. The Optec system resides in one of the Pettit shared laboratories open to Georgia Tech academic users, small and large companies, and external academic and government research institutions. IEN’s shared laboratories are part of the NSF-funded National Nanotechnology Coordinated Infrastructure (NNCI), a network of 16 academic nanofabrication and -characterization sites and their partners in the U.S., formed to advance research in nanoscale science, engineering and technology.
The WS-FLEX IR femtosecond laser with sub-500 fs pulse length IR femtosecond laser will be equipped with 300 x 300 mm XY stages, a 2-D scan head, including synchronized infinite-field-of-view motion control, plus a fixed-beam cutting head with coaxial gas shielding for maximum versatility and a high definition, zoom inspection microscope under the control of the onboard ProcessPower and OptecCAD laser micro-machining software.
The addition of femtosecond capability compliments IEN’s selection of laser processing equipment , covering deep UV through far IR wavelengths, including an Optec excimer-based MicroMaster mask-projection system, and now ultrashort pulse output through continuous wave (CW) output.